#chemical_vapor_deposition
Chemical vapor deposition
Method used to apply surface coatings
Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films.
Thu 6th
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Chemical vapor deposition Physical vapor deposition Plasma-enhanced chemical vapor deposition Metalorganic vapour-phase epitaxy Vacuum deposition Laser chemical vapor deposition Combustion chemical vapor deposition Chemical vapor deposition of ruthenium Graphene Electron-beam physical vapor deposition
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