Particle deposition

Particle deposition is the spontaneous attachment of particles to surfaces. The particles in question are normally colloidal particles, while the surfaces involved may be planar, curved, or may represent particles much larger in size than the depositing ones. Deposition processes may be triggered by appropriate hydrodynamic flow conditions and favorable particle-surface interactions. Depositing particles may just form a monolayer which further inhibits additional particle deposition, and thereby one refers to surface blocking. Initially attached particles may also serve as seeds for further particle deposition, which leads to the formation of thicker particle deposits, and this process is termed as surface ripening or fouling. While deposition processes are normally irreversible, initially deposited particles may also detach. The latter process is known as particle release and is often triggered by the addition of appropriate chemicals or a modification in flow conditions.

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